Capacitor, method of manufacturing a capacitor and method of manufacturing a semiconductor device

A method of manufacturing a capacitor, comprising:

• forming a lower electrode structure on a substrate, the lower electrode structure having a sidewall, an upper surface and a rounded surface between the sidewall and the upper surface;
• forming a ferroelectric layer pattern on the lower electrode structure;
• and
• forming an upper electrode structure on the ferroelectric layer pattern.

A method of manufacturing a semiconductor device, comprising:

• providing a conductive structure on a substrate;
• forming an insulation layer covering the conductive structure on the substrate;
• forming a plug through the insulation layer, the plug being electrically connected to the conductive structure;
• forming a lower electrode structure on the plug and the insulation layer, the lower electrode structure including a sidewall, an upper surface and a rounded surface between the sidewall and the upper surface;
• forming a ferroelectric layer pattern on the lower electrode structure;
• and
• forming an upper electrode structure on the ferroelectric layer pattern.