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US 2009/0021716 A1Published application
Illumination system for a microlithographic projection exposure apparatus
AssigneeCarl Zeiss SMT GmbH
InventorsJohannes Wangler, Heiko Siekmann, Kenneth Weible, Ralf Scharnweber, Manfred Maul, Markus Deguenther, Michael Layh, Axel Scholz, Uwe Spengler, Reinhard Voelkel
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Abstract
Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.
Claims44
A system, comprising:
- an optical integrator configured so that, when light impinges thereon, the optical integrator produces secondary light sources;
- and
- a scattering structure comprising pseudo-randomly configured subelements,
- wherein:
- each subelement is configured so that, when light impinges thereon, each subelement substantially increases a geometrical optical flux of light only in one direction;
- and
- the system is an illumination system configured to be used in a microlithographic projection exposure apparatus.
4 more elements
A system, comprising:
- an optical integrator;
- and
- at least one scattering structure comprising a plurality of subelements that are configured so that, when light impinges thereon, the subelements produce rectangular angular light distributions having different angular widths,
- wherein the system is an illumination system configured to be used in a microlithographic projection exposure apparatus.
1 more element
Dependencies are inferred from the claim text.