Projection optical system, exposure apparatus, exposure method, display manufacturing method, mask, and mask manufacturing method

An exposure apparatus for, while moving a first object and a second object along a scanning direction, performing projection exposure on the second object, the exposure apparatus comprising:

• a first projection optical system for forming an enlargement image of a first portion on the first object in a first region being a partial region on the second object;
• a second projection optical system for forming an enlargement image of a second portion from the first portion on the first object in a second region different from the partial region on the second object;
• and
• a first stage holding the first object and making at least one of the first portion and the second portion of the first object movable along a non-scanning direction;
• wherein the first region and the second region are arranged at a predetermined interval along the non-scanning direction intersecting with the scanning direction.

An exposure apparatus for performing projection exposure while scanning a first object and a second object relative to a projection optical apparatus, the exposure apparatus comprising:

• a first stage holding the first object;
• and
• a second stage holding the second object;
• wherein the projection optical apparatus comprises a plurality of projection optical systems arranged along a non-scanning direction intersecting with a scanning direction and each having an enlargement magnification;
• wherein a plurality of projection exposures are carried out while the first and second stages are moved at a speed ratio according to a ratio of the enlargement magnification and along the scanning direction, and wherein the first and second stages are moved along the non-scanning direction between the plurality of projection exposures.

A projection optical system with at least one catadioptric system,

• wherein the catadioptric system is an optical system for projecting an image of a first plane onto a second plane, and
• wherein the catadioptric system comprises:
• a concave reflecting mirror disposed in an optical path between the first plane and the second plane;
• a first lens unit disposed in an optical path between the first plane and the concave reflecting mirror and having a positive refracting power;
• a first path deflecting surface disposed in an optical path between the first lens unit and the concave reflecting mirror and adapted to deflect the optical path;
• a second lens unit disposed in an optical path between the first path deflecting surface and the concave reflecting mirror;
• a second path deflecting surface disposed in an optical path between the second lens unit and the second plane and adapted to deflect the optical path;
• and
• a third lens unit disposed in an optical path between the second path deflecting surface and the second plane and having a positive refracting power;
• the projection optical system satisfying the following condition:
• |1<FPG3/FPG1<2.5,
• where FPG1 is a focal length of the first lens unit and FPG3 is a focal length of the third lens unit.

An exposure method for performing projection exposure while scanning a first object and a second object relative to a projection optical apparatus, the exposure method comprising:

• a first exposure step of, using a plurality of projection optical systems arranged along a non-scanning direction intersecting with a scanning direction, forming a plurality of exposure regions on the second object while moving the second object in the scanning direction;
• a first stepping step of moving the second object along the non-scanning direction;
• a second exposure step of, using the plurality of projection optical systems, forming a plurality of exposure regions on the second object while moving the second object in the scanning direction;
• and
• a second stepping step of moving the second object along the non-scanning direction;
• wherein in the first stepping step at least one of the plurality of exposure regions to be formed in the second exposure step is positioned between the plurality of exposure regions formed in the first exposure step;
• and
• wherein in the second stepping step the second object is moved along the non-scanning direction over a width along the non-scanning direction of the plurality of exposure regions formed on the second object in the first or second exposure step.