Lithographic apparatus and device manufacturing method
AssigneesASML Netherlands B.V., Carlzeiss Smt AG
InventorsJohannes Catharinus Hubertus Mulkens, Johannes Jacobus Matheus Baselmans, Paul Graupner, Erik Roelof Loopstra, Bob Streefkerk
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Abstract
An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection system and the substrate. The tuner is arranged to adjust one or more properties of the liquid such as the shape, composition, refractive index and/or absorptivity as a function of space and/or time in order to change the imaging performance of the lithography apparatus.
Claims39
1-69. (canceled)
A lithographic projection apparatus, comprising:
- a support structure configured to hold a patterning device, the patterning device configured to pattern the beam of radiation according to a desired pattern;
- a substrate table configured to hold a substrate;
- a projection system configured to project the patterned beam onto a target portion of the substrate;
- a liquid supply system configured to supply a liquid to a space through which the beam of radiation passes, the liquid having an optical property that can be tuned;
- and
- a tuner configured to control spatial dependence of the optical property of liquid in the space.
A device manufacturing method, comprising:
- providing a liquid in a space through which a beam of radiation passes;
- controlling spatial dependence of an optical property of the liquid in the space;
- and
- projecting the beam of radiation as patterned by a patterning device onto a target portion of a substrate.
A lithographic projection apparatus comprising:
- a support structure configured to hold a patterning device, the patterning device configured to pattern the beam of radiation according to a desired pattern;
- a substrate table configured to hold a substrate;
- a projection system configured to project the patterned beam onto a target portion of the substrate;
- a lens formed from a liquid and having an optical property that can be tuned, or a liquid supply system configured to supply a liquid to a space through which the beam of radiation passes, the liquid having an optical property that can be tuned, or both the lens and the liquid supply system;
- and
- a tuner configured to spatially vary an optical property of the liquid.
Dependencies are inferred from the claim text.