Transflective pixel structure and fabricating method thereof

A transflective pixel structure, suitable for being disposed on a substrate, the transflective pixel structure comprising:

• a gate, disposed on the substrate;
• a gate insulator, disposed on the substrate, wherein the gate insulator covers the gate;
• a channel layer, disposed on the gate insulator, wherein the channel layer is located above the gate;
• a metal layer, disposed on part of the channel layer, wherein the metal layer comprises a source and a data line;
• a transflective conductive layer, disposed on part of the channel layer and part of the gate insulator, wherein the transflective conductive layer comprises a drain and a first transflective film connected to the drain, and the transflective conductive layer and the metal layer respectively correspond to two sides of the gate;
• a passivation layer, disposed on the metal layer, the transflective conductive layer, and part of the channel layer;
• and
• a second transflective film, disposed on part of the passivation layer, wherein the second transflective film is located above the first transflective film.