Exposure method and apparatus

An exposure method for exposing a photosensitive material to light in an intended two-dimensional pattern, the method comprising the steps of:

• performing spatial light modulation on light, the light being emitted from a light source, by a spatial light modulation means including a multiplicity of two-dimensionally-arranged pixel units for modulating incident light based on a predetermined control signal;
• forming an image of each of light beams corresponding to the pixel units, on which the spatial light modulation has been performed by the spatial light modulation means, by passing each of the light beams through a first imaging optical system;
• passing each of the light beams separately through a multiplicity of two-dimensionally-arranged micro lenses respectively in the vicinity of the imaging position of each of the light beams, the image of which was formed by passing each of the light beams through the first imaging optical system;
• and
• forming an image of a two-dimensional pattern on the photosensitive material by forming an image of each of the light beams passed separately through the respective microlenses on the photosensitive material by a second imaging optical system, wherein the imaging position of each of the light beams by the first imaging optical system and/or the second imaging optical system is controlled separately for each of the light beams so that the image of the two-dimensional pattern formed on the photosensitive material coincides with the intended two-dimensional pattern.

An exposure method for exposing a photosensitive material to light in an intended two-dimensional pattern, the method comprising the steps of:

• performing spatial light modulation on light, the light being emitted from a light source, by a spatial light modulation means including a multiplicity of two-dimensionally-arranged pixel units for modulating incident light based on a predetermined control signal;
• forming an image of each of light beams corresponding to the pixel units, on which the spatial light modulation has been performed by the spatial light modulation means, by passing each of the light beams through a first imaging optical system;
• and
• passing each of the light beams separately through a multiplicity of two-dimensionally-arranged microlenses respectively in the vicinity of the imaging position of each of the light beams, the image of which was formed by passing each of the light beams through the first imaging optical system, so as to directly form an image of each of the light beams on the photosensitive material, thereby forming an image of a two-dimensional pattern on the photosensitive material, wherein the imaging position of each of the light beams by the first imaging optical system is controlled separately for each of the light beams so that the image of the two-dimensional pattern formed on the photosensitive material coincides with the intended two-dimensional pattern.

An exposure apparatus for exposing a photosensitive material to light in an intended two-dimensional pattern, the exposure apparatus comprising:

• a light source;
• a spatial light modulation means for performing spatial light modulation on light emitted from the light source, the spatial light modulation means including a multiplicity of two-dimensionally-arranged pixel units for modulating the light based on a predetermined control signal;
• a first imaging optical system for forming an image of each of light beams corresponding to the pixel units, on which the spatial light modulation has been performed by the spatial light modulation means;
• a microlens array including a multiplicity of two-dimensionally-arranged microlenses for separately passing each of the light beams, each of the microlenses being placed in the vicinity of the imaging position of each of the light beams, the image of which was formed by passing each of the light beams through the first imaging optical system;
• a second imaging optical system for forming an image of a two-dimensional pattern on the photosensitive material by forming an image of each of the light beams passed separately through the respective microlenses on the photosensitive material;
• and
• an imaging position control means for controlling the imaging position of each of the light beams, the imaging position by the first imaging optical system and/or the second imaging optical system, separately for each of the light beams so that the image of the two-dimensional pattern formed on the photosensitive material coincides with the intended two-dimensional pattern.

An exposure apparatus for exposing a photosensitive material to light in an intended two-dimensional pattern, the exposure apparatus comprising:

• a light source;
• a spatial light modulation means for performing spatial light modulation on light emitted from the light source, the spatial light modulation means including a multiplicity of two-dimensionally-arranged pixel units for modulating the light based on a predetermined control signal;
• a first imaging optical system for forming an image of each of light beams corresponding to the pixel units, on which the spatial light modulation has been performed by the spatial light modulation means;
• a microlens array including a multiplicity of two-dimensionally-arranged microlenses for separately passing each of the light beams, each of the microlenses being placed in the vicinity of the imaging position of each of the light beams, the image of which was formed by passing each of the light beams through the first imaging optical system, wherein an image of a two-dimensional pattern is formed on the photosensitive material by directly forming an image of each of the light beams passed separately through the respective microlenses on the photosensitive material;
• and
• an imaging position control means for controlling the imaging position of each of the light beams, the imaging position by the first imaging optical system, separately for each of the light beams so that the image of the two-dimensional pattern formed on the photosensitive material coincides with the intended two-dimensional pattern.