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US 2009/0020747 A1Published application
Method for realizing a hosting structure of nanometric elements
AssigneeSTMicroelectronics S.r.l.
InventorsDanilo Mascolo, Gianfranco Cerofolini, Gianguido Rizzotto
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Abstract
A nanometric device comprising a substrate; a plurality of conductive spacers of a conductive material, each conductive spacer being arranged on top of and transverse to the substrate, the conductive spacers including respective pairs of conductive spacers defining respective hosting seats each of less than 30 nm wide; and a plurality of nanometric elements respectively accommodated in the hosting seats.
Claims20
A nanometric device comprising:
- a substrate;
- a plurality of conductive spacers of a conductive material, each conductive spacer being arranged on top of and transverse to the substrate, the conductive spacers including respective pairs of conductive spacers defining respective hosting seats each of less than 30 nm wide;
- and
- a plurality of nanometric elements respectively accommodated in the hosting seats.
1 more element
A nanometric device comprising:
- a substrate;
- and
- a plurality of spacers arranged on top of and transverse to the substrate, wherein each spacer is formed of a conductive material, and the spacers include pairs of adjacent spacers respectively defining hosting seats each of less than 30 nm wide.
A nanometric device comprising:
- a substrate;
- a plurality of first spacers of a first material;
- and
- a plurality of second spacers of a second material;
- wherein the first spacers and the second spacers are alternately arranged on top of and transverse to the substrate, and each second spacer is less than 30 nm wide.
2 more elements
Dependencies are inferred from the claim text.