Method for manufacturing solar cell and solar cell, and method for manufacturing semiconductor device

A method for manufacturing a solar cell by forming a p-n junction in a semiconductor substrate having a first conductivity type, wherein, at least:

• a first coating material containing a dopant and an agent for preventing a dopant from scattering, and a second coating material containing a dopant, are coated on the semiconductor substrate having the first conductivity type so that the second coating material may be brought into contact with at least the first coating material;
• and, a first diffusion layer formed by coating the first coating material, and a second diffusion layer formed by coating the second coating material the second diffusion layer having a conductivity is lower than that of the first diffusion layer are simultaneously formed by a diffusion heat treatment.

A method for manufacturing a solar cell by forming a p-n junction in a semiconductor substrate having a first conductivity type, wherein, at least:

• a groove is formed on the semiconductor substrate having the first conductivity type;
• a first coating material containing a dopant and an agent for preventing a dopant from scattering is coated on the whole surface of the substrate;
• and, a first diffusion layer formed in a bottom of the groove on the semiconductor substrate, and a second diffusion layer formed in a portion other than the bottom of the groove the second diffusion layer having a conductivity is lower than that of the first diffusion layer are simultaneously formed by a diffusion heat treatment.

A method for manufacturing a semiconductor device, wherein, at least:

• a first coating material containing a dopant and an agent for preventing a dopant from scattering, and a second coating material containing a dopant, are coated on a semiconductor substrate having a first conductivity type;
• and, a first diffusion layer formed by coating the first coating material, and a second diffusion layer formed by coating the second coating material, the second diffusion layer having a conductivity is different from that of the first diffusion layer are simultaneously formed by a diffusion heat treatment.

A coating material which is coated on a semiconductor substrate to dope a dopant into the semiconductor substrate by thermal diffusion, wherein the coating material includes at least a dopant and an agent for preventing a dopant from scattering.