Method and apparatus for cleaning a substrate
OwnerSteven Verhaverbeke, J. Kelly Truman +2inventors
InventorsSTEVEN VERHAVERBEKE, J. Kelly Truman, Alexander Ko, Rick R. Endo
Life of this patent
Estimating the term…
Abstract
An apparatus for wet processing individual substrates comprising; a means for holding the substrate; a means for providing acoustic energy to a non-device side of the substrate; and a means for flowing a fluid onto a device side of the substrate.
Claims20
An apparatus for processing an individual substrate, comprising:
- a rotatable substrate holding bracket;
- a platter supported in a chamber;
- means for flowing a first chemical between said substrate and said platter;
- means for applying a second liquid chemical to a topside of said substrate;
- means for providing acoustic energy to a bottom side of said substrate;
- and
- wherein said platter comprises a dished-out center area having sidewalls separated by a width greater than a width of said substrate for positioning said substrate within said dished-out center area.
An apparatus for processing an individual substrate comprising:
- a platter supported in a chamber, said platter having a frontside and a backside, wherein said platter frontside further comprises a dished-out center area having sidewalls;
- a substrate holding bracket for positioning a substrate over said platter;
- and
- an opening in said platter connected with a first fluid source.
An apparatus for wet processing a frontside of an individual substrate comprising:
- a platter supported in a chamber;
- said platter having a frontside and backside wherein said platter includes a plurality of megasonics transducers formed on said platter backside;
- wherein said platter further comprises a dished-out center area on said frontside of said platter, said dished-out center area having sidewalls separated by a width greater than a width of said substrate;
- a substrate holder to position said substrate having a frontside and backside within said dished-out center area, wherein said substrate backside is separated by a gap from said platter frontside;
- an opening in said platter to flow a fluid in said gap between said substrate backside and said platter frontside;
- and
- a nozzle positioned over said substrate frontside for directing a cleaning liquid onto said frontside of said substrate.
The apparatus of claim 17, wherein said dished-out center area has a top portion and a bottom portion, wherein said diameter separating said sidewalls at said top portion is larger than said diameter separating said sidewalls at said bottom portion.
Dependencies are inferred from the claim text.