Plasma generating apparatus
AssigneeSamsung Eletronics Co., Ltd.
InventorsSang Jean Jeon, Yuri Tolmachev, Su Ho Lee, Seoung Hyun Seok, Young Min Park, Won Hyuk Jang
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Abstract
A plasma generating apparatus having superior plasma generation efficiency that uses a single reaction chamber. The plasma generating apparatus includes a RF generator for providing a RF power, an antenna for generating an electromagnetic field upon receiving the RF power, a reaction chamber for exciting/ionizing a reaction gas via the electromagnetic field, and generating a plasma, and a plasma channel for absorbing the RF power, and allowing a current signal to be induced to the plasma.
Claims22
A plasma generating apparatus comprising:
- a RF generator for providing a RF power;
- an antenna for generating an electromagnetic field upon receiving the RF power;
- a reaction chamber for exciting/ionizing a reaction gas via the electromagnetic field, and generating a plasma;
- and
- a plasma channel for absorbing the RF power, and allowing a current signal to be induced to the plasma.
A plasma generating apparatus comprising:
- a reaction chamber for generating a plasma;
- a RF generator for providing a RF power to generate the plasma;
- an antenna system generating an electromagnetic field upon receiving the RF power;
- and
- a plasma channel for absorbing the RF power, and allowing a current signal to be induced to the plasma.
Dependencies are inferred from the claim text.