Concentric flow-through plasma reactor and methods therefor
OwnerXuegeng Li, Maxim Kelman +4inventors
InventorsXuegeng Li, Maxim Kelman, Mason Terry, Elena Rogojina, Eric Schiff, Karel Vanheusden
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Abstract
The present invention provides a radiofrequency plasma apparatus for the production of nanoparticles and method for producing nanoparticles using the apparatus. The apparatus is designed to provide high throughput and makes the continuous production of bulk quantities of high-quality crystalline nanoparticles possible. The electrode assembly of the plasma apparatus includes an outer electrode and a central electrode arranged in a concentric relationship to define an annular flow channel between the electrodes.
Claims31
A plasma processing apparatus, comprising:
- an outer tube, the outer tube including an outer tube longitudinal length, an outer tube inner surface, and an outer tube outer surface;
- an inner tube, the inner tube including an inner tube longitudinal length and an inner tube outer surface, wherein the outer tube inner surface and the inner tube outer surface define an annular channel;
- an outer electrode tube, the outer electrode tube including an outer electrode tube longitudinal length, the outer electrode tube having an outer electrode inner surface disposed on the outer tube outer surface;
- a central electrode, the central electrode including a central electrode longitudinal length, the central electrode being disposed inside the inner tube, the central electrode further configured to be coupled to the outer electrode when an RF energy source is applied to one of the outer electrode and the central electrode.
A plasma processing apparatus, comprising:
- an outer tube, the outer tube including an outer tube inner surface and an outer tube outer surface;
- an inner tube, the inner tube including an inner tube outer surface, wherein the outer tube inner surface and the inner tube outer surface define an annular channel, wherein the annular channel has a gap of about 2 mm to about 50 mm;
- an outer tube dielectric layer disposed adjacent to the outer tube inner surface, the outer tube dielectric layer including a first silicon nitride coating;
- an outer electrode tube, the outer electrode tube having an outer electrode inner surface disposed on the outer tube outer surface;
- an inner tube dielectric layer disposed adjacent to the inner tube outer surface, the inner tube dielectric layer including a second silicon nitride coating;
- a central electrode, the central electrode being disposed inside the inner tube, the central electrode further configured to be coupled to the outer electrode when an RF energy source is applied to one of the outer electrode and the central electrode.
A method for producing nanoparticles in a plasma reactor, comprising:
- introducing a nanoparticle precursor gas into an annular channel;
- and
- igniting a radiofrequency plasma in the annular channel,
- whereby the nanoparticle precursor gas dissociates and forms nanoparticles.
Dependencies are inferred from the claim text.