Lithography Suspect Spot Location and Scoring System
AssigneeSynopsys, Inc.
InventorsMin-Chun Tsai, Charles C. Chiang
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Abstract
A fast method to detect hot spots using foundry independent models that do not require RET/OPC synthesis is presented. In some embodiments of the present invention, sensitive spots are located. Lithography models are used to simulate the geometry near the sensitive spots to produce a model of the area around the sensitive spots. The sensitive spots are scored using a measure such as intensity (of light) or scoring based on contrast.
Claims34
A method of identifying hot spots in an integrated circuit (IC) design for use with a fabrication process having a first critical dimension, the method comprising:
- locating a plurality of sensitive spots in the IC design;
- and
- simulating a plurality of areas around the sensitive spots using a plurality of lithography models having a second critical dimension, wherein the second critical dimension is smaller than the first critical dimension of the fabrication process.
A computer system configured to perform the method of claim.
A system of identifying hot spots in an integrated circuit (IC) design for use with a fabrication process having a first critical dimension, the method comprising:
- means for locating a plurality of sensitive spots in the IC design;
- and
- means for simulating a plurality of areas around the sensitive spots using a plurality of lithography models having a second critical dimension, wherein the second critical dimension is smaller than the first critical dimension of the fabrication process.
Dependencies are inferred from the claim text.