Back to results
US 2008/0293252 A1Published application
Resist removing method and resist removing apparatus
AssigneeDainippon Screen Mfg. Co., Ltd.
InventorMasayuki WADA
Life of this patent
Estimating the term…
Abstract
In an inventive resist removing method, sulfuric acid and hydrogen peroxide water are supplied to a surface of a substrate to remove a resist from the substrate surface. Thereafter, hydrogen peroxide water is supplied to the substrate surface to remove the sulfuric acid from the substrate surface.
Claims7
A resist removing method comprising the steps of:
- supplying sulfuric acid and hydrogen peroxide water to a surface of a substrate to remove a resist from the substrate surface;
- and
- supplying hydrogen peroxide water to the substrate surface after the sulfuric acid/hydrogen peroxide water supplying step to remove the sulfuric acid and the hydrogen peroxide water supplied in the sulfuric acid/hydrogen peroxide water supplying step from the substrate surface.
Dependencies are inferred from the claim text.