Method for Manufacturing Image Sensor
OwnerYong Sil Lee, Jun Sung Oh +1inventors
InventorsYong Sil Lee, Jun Sung Oh, Seung Young Jeong
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Abstract
Disclosed are methods of manufacturing an image sensor. The method can include forming a microlens by depositing photoresist bubbles on a substrate. The photoresist bubbles can be formed and deposited using an inkjet scheme. A curing process of the photoresist can be performed during formation of the photoresist bubbles before the photoresist bubbles are deposited on the substrate. In one embodiment, the photoresist bubbles can be color photoresist bubbles to form a color microlens that can function as a color filter and a microlens.
Claims17
A method of manufacturing an image sensor, comprising:
- forming an interlayer dielectric layer on a substrate;
- forming a color filter on the interlayer dielectric layer;
- and
- depositing photoresist bubbles on the color filter to form microlenses.
A method of manufacturing an image sensor, comprising:
- forming an interlayer dielectric layer on a substrate;
- and
- depositing color photoresist bubbles on the interlayer dielectric layer to form color microlenses.
Dependencies are inferred from the claim text.