Assembly comprising a radiation source, a reflector and a contaminant barrier
AssigneeASML Netherlands B.V.
InventorsWouter Anthon Soer, Maarten Marinus Johannes Wilhelmus Van Herpen
Life of this patent
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Abstract
An assembly including a radiation reflector and a contaminant barrier is disclosed. The contaminant barrier is arranged to receive radiation from a radiation source and to reflect that radiation towards the radiation reflector, and the radiation reflector is arranged to reflect the radiation, received from the contaminant barrier, back towards the contaminant barrier.
Claims18
An assembly comprising:
- a radiation reflector;
- and
- a contaminant barrier,
- wherein the contaminant barrier is arranged to receive radiation from a radiation source and to reflect that radiation towards the radiation reflector, and
- the radiation reflector is arranged to reflect the radiation, received from the contaminant barrier, back towards the contaminant barrier.
An assembly comprising a radiation source configured to emit radiation, a normal incidence collector arranged to reflect the radiation, and a contaminant barrier configured to reflect the radiation during operation.
A lithographic projection apparatus comprising
- a radiation reflector;
- and
- a contaminant barrier;
- and
- a projection system configured to project a patterned radiation beam onto a target portion of a substrate,
- wherein the contaminant barrier is arranged to receive radiation from a radiation source and to reflect that radiation towards the radiation reflector, and
- the radiation reflector is arranged to reflect the radiation, received from the contaminant barrier, back towards the contaminant barrier.
A lithographic projection apparatus comprising
- a radiation source configured to emit radiation;
- a normal incidence collector arranged to reflect the radiation;
- a contaminant barrier configured to reflect the radiation during operation;
- and
- a projection system configured to project a patterned radiation beam onto a target portion of a substrate.
Dependencies are inferred from the claim text.