Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsJacobus Johannus Leonardus Hendricus Verspay, Hans Jansen, Marco Koert Stavenga
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Abstract
In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.
Claims22
-24. (canceled)
A lithographic projection apparatus arranged to project a pattern from a patterning device onto a substrate through a liquid, the apparatus comprising a liquid confinement structure configured to confine the liquid to a space adjacent the substrate, wherein the space is smaller in plan than the substrate, the space is substantially polygonal in plan substantially parallel to the substrate and two corners of the space have a radius of curvature no greater than a width of a transition zone between the space configured to contain liquid and a surrounding space configured not to have liquid.
A lithographic projection apparatus, comprising:
- an illuminator configured to condition a radiation beam;
- a support constructed to hold a patterning device, the patterning device configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam;
- a substrate table constructed to hold a substrate;
- a projection system configured to project the patterned radiation beam onto a target portion of the substrate;
- and
- a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, the liquid supply system comprising a liquid confinement structure configured to at least partly confine the liquid within the space, wherein an inner periphery of the liquid confinement structure adjacent the liquid substantially forms a polygon and two corners of the inner periphery have a radius of curvature no greater than a width of a transition zone between the space configured to contain liquid and a surrounding space configured not to have liquid.
A device manufacturing method, comprising:
- supplying liquid to a space adjacent a substrate, wherein the space is smaller in plan than the substrate, the space is substantially polygonal in plan substantially parallel to the substrate and two corners of the space have a radius of curvature no greater than a width of a transition zone between the space containing liquid and a surrounding space not containing liquid;
- and
- projecting a patterned beam of radiation through the liquid onto the substrate.
A device manufacturing method, comprising:
- at least partly confining a liquid to a space between a projection system of a lithographic apparatus and a substrate using a liquid confinement structure, an inner periphery of the liquid confinement structure substantially forming a polygon and two corners of the inner periphery having a radius of curvature no greater than a width of a transition zone between the space containing liquid and a surrounding space not containing liquid;
- and
- projecting a patterned beam of radiation through the liquid onto the substrate.
A liquid confinement structure for a lithographic projection apparatus arranged to project a pattern from a patterning device onto a substrate through a liquid, the liquid confinement structure configured to confine the liquid to a space adjacent the substrate, wherein the space is smaller in plan than the substrate, the space is substantially polygonal in plan substantially parallel to the substrate and two corners of the space have a radius of curvature no greater than a width of a transition zone between the space configured to contain liquid and a surrounding space configured not to have liquid.
Dependencies are inferred from the claim text.