Pellicle, lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsVadim Yevgenyevich Banine, Arno Jan Bleeker
Life of this patent
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Abstract
A pellicle for integrated circuit equipment operating in an EUV range includes a multi-layered structure of alternating layers. The pellicle is constructed and arranged to reflect or absorb undesired radiation and to intercept debris to enhance the spectral purity of a radiation beam.
Claims31
A pellicle for integrated circuit equipment operating in an EUV range, the pellicle comprising a multi-layered structure of alternating layers, the pellicle being constructed and arranged to reflect or absorb undesired radiation and to intercept debris to enhance the spectral purity of a radiation beam.
An assembly comprising
- a pellicle comprising a multi-layered structure of alternating layers, the pellicle being constructed and arranged to reflect or absorb undesired radiation and to intercept debris to enhance the spectral purity of an EUV radiation beam;
- and
- a patterning device constructed and arranged to pattern the EUV radiation beam.
A lithographic apparatus for maskless EUV applications, the apparatus comprising:
- an illumination system constructed and arranged to condition a radiation beam emanating from a source of radiation and to supply the conditioned radiation beam to a spatial light modulator for patterning the radiation beam;
- a substrate table constructed and arranged to hold a substrate;
- a projection system constructed and arranged to project the conditioned radiation beam onto a target portion of the substrate;
- and
- a pellicle arranged between the illumination module and the spatial light modulator, the pellicle comprising a multi-layered structure of alternating layers, wherein the pellicle is constructed and arranged to reflect or absorb undesired radiation and to intercept debris to enhance the spectral purity of the radiation beam.
A lithographic apparatus for EUV applications comprising:
- an illumination system constructed and arranged to condition a radiation beam;
- a support constructed and arranged to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, whereby the support is displaceably arranged;
- a substrate table constructed and arranged to hold a substrate;
- a projection system constructed and arranged to project the patterned radiation beam onto a target portion of the substrate;
- and
- a pellicle comprising a multi-layered structure of alternating layers, wherein the pellicle is constructed and arranged to reflect or absorb undesired radiation and to intercept debris to enhance the spectral purity of the radiation beam.
A device manufacturing method comprising:
- intercepting a beam of EUV radiation with a pellicle;
- enhancing the spectral purity of the beam of EUV radiation with the pellicle by reflecting or absorbing undesired radiation and intercepting debris;
- patterning the beam of EUV radiation with a patterning device;
- and
- projecting the patterned beam of EUV radiation onto a substrate.
Dependencies are inferred from the claim text.