Methods for forming an assembly for transfer of a useful layer
AssigneeS.O.I.Tec Silicon on Insulator Technologies
InventorsFabrice Letertre, Olivier Rayssac
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AssigneeS.O.I.Tec Silicon on Insulator Technologies
InventorsFabrice Letertre, Olivier Rayssac
Estimating the term…
Methods for transferring of a useful layer from a support are described. In an embodiment, the method includes for facilitating transfer of a useful layer from a support by providing an interface in a first support to define a useful layer; and forming a peripheral recess on the first support below the interface so that the periphery of the interface is exposed to facilitate removal and transfer of the useful layer. An epitaxial layer can be formed on the useful layer after forming the recess, with the width and depth of the recess being sufficient to accommodate the volume of residual material resulting from formation of the epitaxial layer without covering the periphery of the interface. Alternatively, an epitaxial layer can be formed on the useful layer after forming the recess, wherein the peripheral recess is configured for receiving sufficient residual material from the epitaxial layer to prevent bonding between the residual material and the useful layer.
A support for fabricating substrates or components on substrates which can receive at least a portion of a useful layer, having an interface between the support and a useful layer, wherein the useful layer forms a peripheral zone of material that at least partially covers the interface and the support comprises a peripheral recess zone for receiving the peripheral zone of material to prevent bonding between the residual material and the useful layer.
A substrate comprising a support and a useful layer having an interface therebetween, wherein the useful layer is intended to be transferred to a second support by affixing a free surface of the useful layer to the second support and detaching it at the interface, wherein the useful layer forms a peripheral zone of material that can at least partially cover the interface and the substrate comprises at least one separating cut or channel located between a free surface of the useful layer and the interface to separate the useful layer from contact with the peripheral zone of material.
Dependencies are inferred from the claim text.