CMOS image sensor and method for fabricating the same
OwnerChang Young Honginventor
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Abstract
A CMOS image sensor and a method for fabricating the same improve photosensitivity by imparting a color filter layer with the function of a microlens layer. The CMOS image sensor includes a semiconductor substrate; a plurality of photo-sensing elements formed in the semiconductor substrate; and a color filter layer comprised of a plurality of color filters for filtering light according to wavelength, wherein the plurality of color filters correspond to the plurality of photo-sensing elements and each color filter has a predetermined curvature for focusing light and for transmitting the focused light according to a corresponding wavelength.
Claims6
A CMOS image sensor comprising:
- a semiconductor substrate;
- a plurality of photo-sensing elements formed in said semiconductor substrate;
- and
- a color filter layer comprised of a plurality of color filters for filtering light according to wavelength, wherein the plurality of color filters correspond to said plurality of photo-sensing elements and each color filter has a predetermined curvature for focusing light and for transmitting the focused light according to a corresponding wavelength.
A CMOS image sensor comprising:
- a microlens layer made of colored resist.
6-12. (canceled)
Dependencies are inferred from the claim text.