# US 2008/0188383 A1 · Amorphous Carbon Film, Process For Forming the Same, and High Wear-Resistant Sliding Member With Amorphous Carbon Film Provided

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- Number: US 2008/0188383 A1
- Document ID: US20080188383A1
- Status: Published application
- Kind: A1
- Application number: 11/720,154
- Filed: 2005-11-24
- Published: 2008-08-07
- Earliest claimed: 2004-11-25
- Assignees: Kabushiki Kaisha Toyota Chuo Kenkyusho
- Inventors: Takashi Iseki; Hideo Tachikawa; Hiroyuki Mori; Kazuyuki Nakanishi; Munehisa Matsui; Shintaro Igarashi; Fumio Shimizu; Yoshinari Tsuchiya; Tadashi Oshima
- Web page: https://patentgrep.com/patent/US20080188383A1

## CPC

- C23C 16/26: Deposition of carbon only
- Y10T 428/30: Self-sustaining carbon mass or layer with impregnant or other layer
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)
- Y10T: TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION

## Abstract

An amorphous carbon film includes carbon as a major component, and silicon in an amount of from 0.1 atomic % or more to 10 atomic % or less when the entire amorphous carbon film is taken as 100 atomic %. The carbon is composed of carbon having an sp2 hybrid orbital in an amount of from 60 atomic % or more to 90 atomic % or less when the entire carbon amount is taken as 100 atomic %. Also disclosed is a process for producing the amorphous carbon film.

## Claims

### Claim 1

An amorphous carbon film, comprising:
carbon as a major component, the carbon composed of carbon having an sp2 hybrid orbital in an amount of from 60 atomic % or more to 90 atomic % or less when the entire carbon amount is taken as 100 atomic %; and
silicon in an amount of from 1 atomic % or more to 10 atomic % or less when the entire amorphous carbon film is taken as 100 atomic %.

### Claim 2 (depends on 1)

The amorphous carbon film set forth in claim 1 further comprising hydrogen in an amount of from 10 atomic % or more to 30 atomic % or less when the entire amorphous carbon film is taken as 100 atomic %.

### Claim 3 (depends on 1)

A process for forming the amorphous carbon film set forth in claim 1 on a surface of a substrate by means of plasma chemical vapor deposition, the process comprising:
disposing a substrate in a reactor chamber;
introducing a reaction gas into the reactor chamber,
the reaction gas comprising:
at least one member selected from the group consisting of hydrocarbon gases including carbon having an sp2 hybrid orbital, and hydrocarbon gases decomposed by electric discharge to generate carbon having an sp2 hybrid orbital; and
a silicon compound gas; and
electrically discharge the reaction gas.

### Claim 4 (depends on 3)

The process set forth in claim 3, wherein the hydrocarbon gases having an sp2 hybrid orbital comprise at least one member selected from the group consisting of benzene, toluene and naphthalene.

### Claim 5

A high wear-resistant sliding member, comprising:
a substrate; and
an amorphous carbon film formed on a part of a surface of the substrate at least, the amorphous carbon film comprising:
carbon as a major component, the carbon composed of carbon having an sp2 hybrid orbital in an amount of from 60 atomic % or more to 90 atomic % or less when the entire carbon amount is taken as 100 atomic %; and
silicon in an amount of from 1 atomic % or more to 10 atomic % or less when the entire amorphous carbon film is taken as 100 atomic %.