# US 2008/0188168 A1 · Polishing material having polishing particles and method for making the same > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2008/0188168 A1 - Document ID: US20080188168A1 - Status: Published application - Kind: A1 - Application number: 11/702,217 - Filed: 2007-02-05 - Published: 2008-08-07 - Earliest claimed: 2007-02-05 - Assignees: San Fang Chemical Industry Co., Ltd. - Inventors: Chung-Chih Feng; I-Peng Yao; Lyang-Gung Wang; Yung-Chang Hung; Chao-Yuan Tsai - Web page: https://patentgrep.com/patent/US20080188168A1 ## CPC - B24B 37/26: characterised by the shape of the lapping pad surface, e.g. grooved - B24D 11/001: {Manufacture of flexible abrasive materials} - B24B: MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING (grinding of gear teeth B23F, of screw-threads B23G1/36; by electro-erosion B23H; abrasive or related blasting B24C; tools for grinding, buffing or sharpening B24D; polishing compositions C09G1/00; abrasives C09K3/14; electrolytic etching or polishing C25F3/00; grinding arrangements for use on assembled railway tracks E01B31/17); DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS - B24D: TOOLS FOR GRINDING, BUFFING OR SHARPENING (abrading-bodies specially designed for tumbling apparatus, e.g. abrading-balls B24B31/14; honing tools B24B33/08; lapping tools B24B37/11) ## Abstract The present invention relates to a polishing material having polishing particles and a method for making the same. The polishing material having polishing particles includes a base material, a plurality of polishing particles and a high polymer elastic body. The base material has a plurality of fibers for defining a plurality of grid-spaces. The polishing particles are distributed in the grid-spaces. The high polymer elastic body covers the base material and the polishing particles. Whereby, the polishing particles are uniformly distributed on a surface of a polishing workpiece during the polishing process. Furthermore, the base material prevents the polishing particles from contacting the polishing workpiece so as to avoid the scratch of the polishing workpiece. Also, the base material provides effects for sweeping the small grinded pieces. ## Claims ### Claim 1 A polishing material having polishing particles, comprising: a base material, having a plurality of fibers for defining a plurality of grid-spaces; a plurality of polishing particles, distributed in the grid-spaces; and a high polymer elastic body, covering the base material and the polishing particles. ### Claim 2 (depends on 1) The polishing material according to claim 1, wherein the base material is a fabric material. ### Claim 3 (depends on 2) The polishing material according to claim 2, wherein the material of the fibers is selected from a group consisting of polypropylene (PP), polyester (PET), and nylon, or a combination thereof. ### Claim 4 (depends on 3) The polishing material according to claim 3, wherein the fabric material is a non-woven fabric. ### Claim 5 (depends on 1) The polishing material according to claim 1, wherein part of the fibers is exposed on a surface of the polishing material. ### Claim 6 (depends on 1) The polishing material according to claim 1, wherein the high polymer elastic body is selected from polypropylene (PP), polyester (PET), or polyurethane resin. ### Claim 7 (depends on 1) The polishing material according to claim 1, wherein the high polymer elastic body is a continuous foam body. ### Claim 8 (depends on 1) The polishing material as claimed in claim 1, wherein the thinness of the fibers is between 0.001 den and 10 den. ### Claim 9 (depends on 1) The polishing material according to claim 1, wherein the polishing particles are selected from a group consisting of ceria, silicon dioxide, aluminum oxide, yttria, ferric oxide, or a combination thereof. ### Claim 10 (depends on 9) The polishing material according to claim 9, wherein the diameter of the polishing particles is between 0.01 μm and 10 μm. ### Claim 11 (depends on 1) The polishing material according to claim 1, further comprising a plurality of grooves formed on a surface of the polishing material. ### Claim 12 (depends on 11) The polishing material according to claim 11, wherein the grooves have a geometrical shape of triangle, square, or rectangle. ### Claim 13 A method for making a polishing material having polishing particles, comprising: (a) providing a base material having a plurality of fibers for defining a plurality of grid-spaces; (b) immersing the base material in a high polymer solution containing a plurality of polishing particles, such that the polishing particles are distributed in the grid-spaces; and (c) solidifying the high polymer solution attached to the base material to form a high polymer elastic body for covering the base material and the polishing particles. ### Claim 14 (depends on 13) The method according to claim 13, wherein step (c) further comprises a step of coagulating the high polymer solution attached to the base material. ### Claim 15 (depends on 14) The method according to claim 14, further comprising a washing step, after the step of coagulating the high polymer solution attached to the base material. ### Claim 16 (depends on 15) The method according to claim 15, further comprising a baking step to solidifying the high polymer solution, after the washing step. ### Claim 17 (depends on 13) The method according to claim 13, wherein the polishing material has a first surface and a second surface corresponding to the first surface, and the method further comprises a step (d) of polishing the first surface after step (c). ### Claim 18 (depends on 17) The method according to claim 17, wherein the method further comprises a step (e) of trimming the second surface so as to expose the fibers on the second surface after step (d). ### Claim 19 (depends on 18) The method according to claim 18, wherein the method further comprises a step of forming a plurality of grooves on the second surface after step (e).