# US 2008/0187453 A1 · Material mixture, sputter target and method for producing a sputter target

> Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt

- Number: US 2008/0187453 A1
- Document ID: US20080187453A1
- Status: Published application
- Kind: A1
- Application number: 12/101,544
- Filed: 2008-04-11
- Published: 2008-08-07
- Earliest claimed: 2005-10-12
- Assignees: W.C. Heraeus GmbH
- Inventors: Markus SCHULTHEIS; Martin Weigert
- Web page: https://patentgrep.com/patent/US20080187453A1

## CPC

- C23C 14/3414: {Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy}
- C22C 32/0026: {Matrix based on Ni, Co, Cr or alloys thereof}
- B22F 2998/10: Processes characterised by the sequence of their steps
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)
- C22C: ALLOYS (treatment of alloys C21D, C22F)
- B22F: WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER (making alloys by powder metallurgy C22C); APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER

## Abstract

A material mixture is produced having a cobalt-based alloy as the predominant component and an additional component of at least TiOx. The material mixture may be formed into a sputter target by hot pressing.

## Claims

### Claim 1

A material mixture comprising a cobalt-based alloy as a predominant component and a component of lesser amount comprising at least TiOx, wherein x is the atomic ratio of O to Ti.

### Claim 2 (depends on 1)

The material mixture according to claim 1, wherein in the component TiOx, x<2.

### Claim 3 (depends on 2)

The material mixture according to claim 2, wherein in the component TiOx, 1.5<x<1.998.

### Claim 4 (depends on 1)

The material mixture according to claim 1, wherein the component TiOx is in particle form having a particle size in a range of 0.1 to 50 μm.

### Claim 5 (depends on 1)

The material mixture according to claim 1, wherein the mixture is a mixture of a metallic powder of the cobalt-based alloy and an oxide powder of the TiOx.

### Claim 6 (depends on 1)

The material mixture according to claim 1, wherein the cobalt-based alloy is an alloy of cobalt with at least one metal selected from chromium, platinum, tantalum, and boron.

### Claim 7 (depends on 1)

A sputter target produced from a material mixture according to claim 1.

### Claim 8 (depends on 7)

The sputter target according to claim 7, wherein the target has a density of at least 95% of a theoretical density of the material mixture.

### Claim 9 (depends on 7)

A method for producing a sputter target according to claim 7, the method comprising mixing a powder of the cobalt-based alloy with a powder of the TiOx, and hot-pressing the powder mixture.

### Claim 10 (depends on 9)

The method according to claim 9, wherein the powder mixture is pressed hot axially or hot isostatically.