# US 2008/0186579 A1 · System and a Method for Generating Periodic and/or Quasi-Periodic Pattern on a Sample > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2008/0186579 A1 - Document ID: US20080186579A1 - Status: Published application - Kind: A1 - Application number: 11/665,323 - Filed: 2005-10-13 - Published: 2008-08-07 - Earliest claimed: 2004-10-22 - Assignees: Paul Scherrer Institut - Inventors: Harun H. Solak - Web page: https://patentgrep.com/patent/US20080186579A1 ## CPC - G03F 7/70408: {Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect} - G03F 7/2022: {Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure} - G03F 7/22: Exposing sequentially with the same light pattern different positions of the same surface {(G03F7/70 takes precedence)} - G03F 7/70325: {Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lenses or solid immersion lenses} - G03F 7/7035: {Proximity or contact printers} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract A system for generating periodic or quasi-periodic patterns on a sample by means of an interference lithography technique includes a photon source, a mask and a sample holder. The mask has a grating for generating a predetermined pattern, wherein the mask is positioned at a first distance from the photon source. The sample holder is disposed at a second distance from the mask on a side facing away from the photon source. The second distance is selected to be where an intensity distribution is substantially stationary and distance-invariant, or the second distance is varied to obtain a desired average intensity distribution on the sample surface. ## Claims ### Claim 1 A system for generating at least one of a periodic and quasi-periodic pattern on a sample by using an interference lithography technique, comprising: a) a photon source; b) a mask having a grating for generating a predetermined pattern; said mask being positioned at a first distance from the photon source; c) a sample holder for holding the sample being disposed at a second distance from the mask on a side facing away from the photon source, wherein the second distance is selected to be where an intensity distribution is substantially stationary and distance-invariant, or the second distance is varied to obtain a desired average intensity distribution on the sample surface. ### Claim 2 (depends on 1) The system according to claim 1, wherein the photon source emits photons having a wavelength in a range of 1 to 100 nm. ### Claim 3 (depends on 1) The system according to claim 1, wherein the photon source is a plasma source. ### Claim 4 (depends on 1) The system according to claim 1, wherein the mask has a grating selected from a group consisting of a linear grating, a two-dimensional linear grating, a two-dimensional partially non-linear grating, a two-dimensional periodically circular grating, and a two-dimensional non-periodically circular grating. ### Claim 5 (depends on 1) The system according to claim 1, wherein the first distance is at least 1 mm. ### Claim 6 (depends on 1) The system according to claim 1, wherein the second distance is larger than a period of the grating of the mask. ### Claim 7 (depends on 1) The system according to claim 1, wherein the photon source has a substantially isotropic radiation characteristic, and a plurality of mask/sample holder arrangements are displaced around the photon source. ### Claim 8 A method for generating at least one of a periodic and a quasi-periodic pattern on a sample by using an interference lithography technique, comprising: a) providing a photon source; b) providing a mask having a grating for generating a predetermined pattern; c) positioning said mask at a first distance from the photon source; d) providing a sample holder for holding the sample; e) positioning the sample at a second distance from the mask on a side facing away from the photon source, f) choosing the second distance to be in a range where the intensity distribution is substantially stationary and distance-invariant or varying the second distance in a continuous or discrete way to obtain a desired average intensity distribution on the surface; and g) illuminating the sample with radiation originating from the photon source and passing through the mask. ### Claim 9 (depends on 8) The method according to claim 8, wherein light emitted from the photon source is shaped and filtered by a number of optical elements. ### Claim 10 (depends on 8) The method according to claim 8, wherein the photon source is a synchrotron radiation source. ### Claim 11 (depends on 8) The method according to claim 8, wherein the mask and the sample are scanned together to form a desired dose distribution on the sample. ### Claim 12 (depends on 8) The method according to claim 8, wherein the illuminating beam is scanned across the mask and the sample. ### Claim 13 (depends on 8) The method according to claim 8, wherein the sample is displaced in position or angle between multiple exposures to form a desired dose distribution on the sample. ### Claim 14 (depends on 8) The method according to claim 8, wherein a gas is introduced on at least one side of the mask to perform at least one of removal of heat and prevention of contamination.