# US 2008/0186495 A1 · Cylindrical waveguide biosensors

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- Number: US 2008/0186495 A1
- Document ID: US20080186495A1
- Status: Published application
- Kind: A1
- Application number: 11/891,650
- Filed: 2007-08-09
- Published: 2008-08-07
- Earliest claimed: 2005-12-02
- Assignees: State of Oregon acting by and through the State Board of Higher Education on behalf of Portland; State University
- Inventors: Shalini Prasad; Ravi Kiran Reddy
- Web page: https://patentgrep.com/patent/US20080186495A1

## CPC

- G01N 27/3278: {involving nanosized elements, e.g. nanogaps or nanoparticles (nanopores G01N33/48721; magnetic beads G01N27/745)}
- G01N: INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing apparatus or processes other than immunoassay, involving enzymes or microorganisms C12M, C12Q)

## Abstract

Sensors include a substrate having defined thereon at least one polymer optical cavity with a sensitizing agent such as antibodies immobilized on the exterior of the polymer optical cavity. The polymer optical cavity can be defined in a polymer layer that is spin coated onto a substrate and photolithographically exposed. Positive or negative photoresists can be used to define the polymer optical cavity.

## Claims

### Claim 1

A sensor, comprising:
a substrate having defined thereon at least one polymer optical cavity; and
a sensitizing agent immobilized on at least a portion of an exterior of the polymer optical cavity.

### Claim 2 (depends on 1)

The sensor of claim 1, further comprising:
a first polymer waveguide coupled to the polymer optical cavity and configured to deliver an optical interrogation flux to the polymer optical cavity.

### Claim 3 (depends on 2)

The sensor of claim 2, further comprising:
a second polymer waveguide coupled to the polymer optical cavity and configured to receive an optical flux modulated based on the first sensitizing agent.

### Claim 4 (depends on 1)

The sensor of claim 1, wherein the polymer optical cavity is a formed of a polymer photoresist.

### Claim 5 (depends on 1)

The sensor of claim 1, wherein the substrate comprises a silica layer, and the polymer optical cavity is situated adjacent the silica layer.

### Claim 6 (depends on 1)

The sensor of claim 1, wherein the polymer optical cavity is a cylindrical cavity.

### Claim 7 (depends on 6)

The sensor of claim 6, wherein a diameter of the cylindrical cavity is between about 100 μm and 1.0 mm.

### Claim 8 (depends on 4)

The sensor of claim 4, wherein the photoresist is a positive resist.

### Claim 9 (depends on 4)

The sensor of claim 4, wherein the photoresist is a negative resist.

### Claim 10 (depends on 1)

The sensor of claim 1, wherein the sensitizing agent is associated with at least one of CRP and MPO.

### Claim 11

A sensor system, comprising:
a sensitized polymer optical cavity;
a light source coupled to provide an interrogation light flux to the polymer optical cavity; and
a detection system configured to receive a modulated portion of the interrogation light flux from the sensitized polymer cavity and provide an indication of an analyte concentration based on the received portion.

### Claim 12 (depends on 11)

The sensor system of claim 11, further comprising;
an input waveguide configured to couple the interrogation light flux from the light source to the sensitized polymer cavity; and
an output waveguide configured to couple the modulated portion of the interrogation light flux to the detection system.

### Claim 13 (depends on 12)

The sensor system of claim 12, wherein the input waveguide and the output waveguide are of unitary construction with the polymer optical cavity.

### Claim 14

A method, comprising:
applying a photopolymer layer to a substrate;
exposing the photopolymer layer to a patterned light flux associated with at least one optical cavity;
developing the photopolymer so as to define the at least one optical cavity; and
applying a sensitizer to the at least one optical cavity.

### Claim 15 (depends on 14)

The method of claim 14, wherein the photopolymer layer is a photoresist layer.

### Claim 16 (depends on 15)

The method of claim 15, wherein the sensitizer is associated with selective bonding of at least one of MPO or CRP.

### Claim 17 (depends on 15)

The method of claim 15, wherein the photoresist is a positive resist.

### Claim 18 (depends on 15)

The method of claim 15, wherein the photoresist is a negative resist.

### Claim 19 (depends on 14)

The method of claim 14, wherein the patterned light flux is based on at least one optical cavity and at least one waveguide coupled to the at least one optical cavity and the photopolymer is developed so as to define the at least one optical cavity and the at least one waveguide.

### Claim 20 (depends on 11)

The method of claim 11, wherein the optical cavity is cylindrical.