# US 2008/0186476 A1 · Inspection apparatus and method, and production method for pattern substrates > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2008/0186476 A1 - Document ID: US20080186476A1 - Status: Published application - Kind: A1 - Application number: 12/015,059 - Filed: 2008-01-16 - Published: 2008-08-07 - Earliest claimed: 2007-02-02 - Assignees: Lasertec Corporation - Inventors: Haruhiko Kusunose - Web page: https://patentgrep.com/patent/US20080186476A1 ## CPC - G01N 21/956: Inspecting patterns on the surface of objects {(contactless testing of electronic circuits G01R31/308; testing currency G07D; manufacturing processes per se of semiconductor devices implementing a measuring step H10P74/20)} - G01N: INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing apparatus or processes other than immunoassay, involving enzymes or microorganisms C12M, C12Q) ## Abstract According to a first aspect of the present invention, there is provided an inspection apparatus including an objective lens, a reflected illumination optical system that illuminates a first area which is part of a field of view of the objective lens, a transmitted illumination optical system that illuminates the first area and a second area; an adjusting unit that adjusts positions on the sample of transmitted illumination light from the transmitted illumination optical system and reflected illumination light from the reflected illumination optical system; a first detector that detects a transmitted light transmitted by the sample and a reflected light reflected by the sample in the first area; and a second detector that detects through the objective lens a transmitted light transmitted by the sample in the second area. ## Claims ### Claim 1 An inspection apparatus which performs inspection using transmitted light transmitted by a sample and reflected light reflected by the sample, comprising: an objective lens; a reflected illumination optical system that illuminates a first area which is part of a field of view of the objective lens from the objective lens side of the sample; a transmitted illumination optical system that illuminates the first area and a second area which is the other part of the field of view of the objective lens than the first area from the opposite side of the sample from the objective lens; an adjusting unit that adjusts positions on the sample of transmitted illumination light from the transmitted illumination optical system and reflected illumination light from the reflected illumination optical system; a first detector that detects through the objective lens a transmitted light transmitted by the sample in the first area of the transmitted illumination light from the transmitted illumination optical system and a reflected light reflected by the sample in the first area of the reflected illumination light from the reflected illumination optical system; and a second detector that detects through the objective lens a transmitted light transmitted by the sample in the second area of the transmitted illumination light from the transmitted illumination optical system. ### Claim 2 (depends on 1) The inspection apparatus according to claim 1, wherein the transmitted illumination light from the transmitted illumination optical system is incident on the entire field of view of the objective lens. ### Claim 3 (depends on 2) The inspection apparatus according to claim 2, wherein the reflected illumination light from the reflected illumination optical system is incident on substantially a half of the field of view of the objective lens. ### Claim 4 (depends on 1) The inspection apparatus according to claim 1, which picks up by the first detector a combined image of a transmission image formed by the transmitted illumination light and a reflection image formed by the reflected illumination light and picks up by the second detector a transmission image formed by the transmitted illumination light, and which subtracts the transmission image from the combined image of the same position on the sample to obtain the reflection image of the sample. ### Claim 5 An inspection method which performs inspection by detecting through an objective lens transmitted light transmitted by a sample and reflected light reflected by the sample, comprising the steps of: illuminating the sample with reflected illumination light from the objective lens side of the sample to illuminate a first area which is part of a field of view of the objective lens; illuminating the sample with transmitted illumination light from the opposite side of the sample from the objective lens to illuminate the first area and a second area which is the other part of the field of view of the objective lens than the first area; making reflected light reflected by the sample which is part of the reflected illumination light and transmitted light transmitted by the sample which is part of the transmitted illumination light incident on the objective lens, while changing positions on the sample of the transmitted illumination light and the reflected illumination light; detecting through the objective lens the transmitted light and the reflected light from the first area, which is part of the field of view of the objective lens; and detecting through the objective lens the transmitted light from the second area, which is the other part of the field of view of the objective lens than the first area. ### Claim 6 (depends on 5) The inspection method according to claim 5, wherein the transmitted illumination light is incident on the entire field of view of the objective lens. ### Claim 7 (depends on 6) The inspection method according to claim 6, wherein the reflected illumination light is incident on substantially a half of the field of view of the objective lens. ### Claim 8 (depends on 5) The inspection method according to claim 5, wherein by detecting through the objective lens the transmitted light and the reflected light from the first area, a combined image of a transmission image formed by the transmitted illumination light and a reflection image formed by the reflected illumination light is picked up, and by detecting through the objective lens the transmitted light from the second area, a transmission image formed by the transmitted illumination light is picked up, and wherein by subtracting the transmission image from the combined image of the same position on the sample, the reflection image of the sample is obtained. ### Claim 9 (depends on 5) A production method for a pattern substrate, comprising the steps of: inspecting a photomask according to the inspection method of claim 5; repairing a defect of the photomask inspected in the inspecting step; exposing a substrate with the photomask repaired in the repairing step; and developing the exposed substrate.