Method of manufacturing display unit
AssigneeHitachi Displays, Ltd.
InventorsSeiji ISHIKAWA, Jun Ooida, Yoshinori Muramatsu, Takahiro Miyazaki
Life of this patent
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Abstract
An exposure method that suppresses distribution of pattern shapes at the time of exposure. In a manufacturing method for a display unit, a layer forming a reference for pattern arrangement is determined among layers formed on a panel. An arrangement of a pattern in a layer above the reference layer is determined using a value obtained from distribution of the pattern arrangement in the reference layer.
Claims8
A manufacturing method for a display unit, wherein:
- a reference layer that forms a reference for a pattern arrangement is determined among layers formed on a panel;
- and
- pattern arrangement in a layer above the reference layer is determined using a value obtained from pattern arrangement distribution in the reference layer.
A manufacturing method for a display unit, wherein:
- a reference layer that forms a reference for a pattern arrangement is determined among layers formed on a panel;
- and
- the further a layer is above the reference layer, the closer a pattern arrangement in the layer above the reference layer comes to a pattern arrangement in the reference layer.
A manufacturing method for a display unit, comprising:
- a reference pattern arrangement acquisition step of acquiring a pattern arrangement that forms a reference for a pattern in a layer to be formed on a panel;
- a misalignment calculation step of calculating a misalignment between a pattern arrangement in a layer that has been already formed on the panel and is a reference for pattern arrangement, and the reference pattern arrangement acquired in the reference pattern arrangement acquisition step;
- a correction parameter calculation step of calculating a correction parameter to be applied to the reference pattern arrangement to minimize the misalignment;
- a correction quantity calculation step of calculating a correction quantity used for correcting the correction parameter;
- a correction parameter correction step of correcting the correction parameter using the correction quantity calculated in the correction quantity calculation step;
- a tolerance judgment step of judging whether the corrected correction parameter lies within a predetermined tolerance;
- and
- a pattern formation step, in which, when the corrected correction parameter has been judged to lie within the tolerance in the tolerance judgment step, the corrected correction parameter is used to correct the reference pattern arrangement, and the corrected pattern arrangement is used to form the pattern in the layer to be formed.
A manufacturing method for a display unit by overlaying a first panel and a second panel together, wherein:
- information on a pattern arrangement in a layer formed in a manufacturing process of the first panel is used to determine a pattern arrangement formed in a manufacturing process of the second panel.
Dependencies are inferred from the claim text.