US 2008/0176414 A1Published application

Systems and methods for inducing crystallization of thin films using multiple optical paths

AssigneeColumbia University

InventorJames Im

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Abstract

The present invention is directed to systems and methods for irradiating regions of a thin film sample(s) with laser beam pulses having different energy beam characteristics that are generated and delivered via different optical paths. An exemplary method includes generating laser beam pulses having energy beam characteristics, directing a first pulse onto a first optical path, modulating the pulse's energy beam characteristics, and irradiating at least a portion of a first region of the thin film with the pulse to induce crystallization of the portion of the first region. The method also includes directing a second pulse onto a second optical path, modulating the pulse's energy beam characteristics so as to be different from the energy beam characteristics of the first pulse, and irradiating at least a portion of a second region of the thin film with the second pulse to induce crystallization of the portion of the second region.

Claims23

Dependent claims

A method of processing a thin film, comprising:

(a) generating a plurality of laser beam pulses having energy beam characteristics;
(b) directing a generated laser beam pulse onto a first optical path, wherein said first optical element includes at least one optical element;
(c) modulating said energy beam characteristics of said first optical path-directed laser beam pulse via said at least one optical element of said first optical path;
(d) irradiating at least a portion of a first region of said thin film with said first optical path-directed laser beam pulse to induce melting and a subsequent crystallization of said portion of said first region;
(e) directing a generated laser beam pulse onto a second optical path, wherein said second optical element includes at least one optical element;
(f) modulating said energy beam characteristics of said second optical path-directed laser beam pulse via said at least one optical element of said second optical path, wherein said energy beam characteristics of said second optical path-directed laser beam pulse is different from said energy beam characteristics of said first optical path-directed laser beam pulse;
and
(g) irradiating at least a portion of a second region of said thin film with said second optical path-directed laser beam pulse to induce melting and a subsequent crystallization of said portion of said second region.

5 more elements

A method of processing a plurality of thin films, comprising:

(a) generating a plurality of laser beam pulses having energy beam characteristics;
(b) directing a generated laser beam pulse onto a first optical path, wherein said first optical element includes at least one optical element;
(c) modulating said energy beam characteristics of said first optical path-directed laser beam pulse via said at least one optical element of said first optical path;
(d) irradiating a portion of a region of a first thin film with said first optical path-directed laser beam pulse to induce melting and a subsequent crystallization of said portion of said region of said first thin film;
(e) directing a generated laser beam pulse onto a second optical path, wherein said second optical element includes at least one optical element;
(f) modulating said energy beam characteristics of said second optical path-directed laser beam pulse via said at least one optical element of said second optical path, wherein said energy beam characteristics of said second optical path-directed laser beam pulse is different from said energy beam characteristics of said first optical path-directed laser beam pulse;
and
(g) irradiating a portion of a region of a second thin film with said second optical path-directed laser beam pulse to induce melting and a subsequent crystallization of said portion of said region of said second thin film.

5 more elements

Dependencies are inferred from the claim text.

Facts

Application: 11/873,038Filed 16 Oct 2007
Priority: 16 Sep 2003
Published: 24 Jul 2008
Term ends: Not estimatedThe source records don’t support an estimate.

Classification18 codes

H10P 14/3816
Using laser beams: pulsed laser beam
C30B 1/04
By thermal treatment, e.g. strain annealing: isothermal recrystallisation
G03F 7/70041
Production of exposure light, i.e. light sources: by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
G03F 7/70725
Stages: control

Family

Application60/503,425Us provisional application · filed 16 Sep 2003
Application10/754,260Division · filed 9 Jan 2004
Application11/873,038Division
US 2005/0059224 A1Published application
US 7,318,866 B2Related patent
US 8,034,698 B2Related patent
US 2008/0176414 A1This patent

From the US filing history. Foreign family members aren’t listed.