High throughput, low cost dual-mode patterning method for large area substrates

A method for generating a pattern of structures of a material on a substrate, said method comprising the steps of:

• providing a layer of photoablatable material on at least a portion of said substrate;
• removing photoablatable material from selected regions of said layer of photoablatable material via laser ablation;
• thereby generating regions of said substrate masked by said layer of photoablatable material and exposed regions of said substrate;
• depositing a thin film of said material on at least a portion of said exposed regions of said substrate and on said layer of photoablatable material;
• and
• exposing said layer of photoablatable material to a solvent capable of dissolving said photoablatable material, wherein removal of said layer lifts off said material deposited on said layer of photoablatable material and does not remove at least a portion of said thin film of said material deposited on said exposed regions of said substrate, thereby generating said pattern of structures of said material on said substrate.

A method for generating a pattern of structures of a material on a substrate, said method comprising the steps of:

• providing a layer of photoablatable material on at least a portion of said substrate;
• removing photoablatable material from selected regions of said layer of photoablatable material via laser ablation;
• thereby generating regions of said substrate masked by said layer of photoablatable material and exposed regions of said substrate;
• depositing a thin film of said material on at least a portion of said exposed regions of said substrate and on said layer of photoablatable material;
• and
• exposing said layer of photoablatable material to a radiant energy of electromagnetic radiation sufficient to initiate laser ablation of at least a portion of said layer, wherein ablation of said layer lifts off said material deposited on said layer of photoablatable material and does not remove at least a portion of said thin film of said material deposited on said exposed regions of said substrate, thereby generating said pattern of structures of said material on said substrate.

A method for generating a pattern of structures of a material on a substrate, said method comprising the steps of:

• providing a layer of photoablatable material on at least a portion of said substrate;
• removing photoablatable material from selected regions of said layer of photoablatable material via laser ablation;
• thereby generating regions of said substrate masked by said layer of photoablatable material and exposed regions of said substrate;
• depositing a thin film of said material on at least a portion of said exposed regions of said substrate and on said layer of photoablatable material;
• and
• exposing said layer of photoablatable material to a radiant energy of electromagnetic radiation sufficient to remove an ablated portion of said layer, wherein said ablated portion does not extend the entire thickness of said layer, thereby lifting off said material deposited on said layer of photoablatable material;
• and
• exposing said layer of photoablatable material having said ablated portion to a solvent capable of dissolving said photoablatable material, thereby generating said pattern of structures of said material on said substrate.

A method for generating a pattern of structures of an optically transparent conductive material on a display device substrate, said method comprising the steps of:

• providing a layer of photoablatable material on at least a portion of said display device substrate;
• removing photoablatable material from selected regions of said layer of photoablatable material via laser ablation;
• thereby generating regions of said display device substrate masked by said layer of photoablatable material and exposed regions of said display device substrate;
• depositing said optically transparent conductive material on at least a portion of said exposed regions of said display device substrate;
• and
• removing said photoablatable layer, thereby generating said pattern of structures of said optically transparent conductive material on said display device substrate.