Resists for lithography
AssigneePixelligent Technologies, LLC
InventorsGregory D. COOPER, Zhiyun Chen, Z. Serpil Gonen Williams, Larry F. Thompson
Life of this patent
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Abstract
New routes involving multi-step reversible photo-chemical reactions using two-step techniques to provide non-linear resist for lithography are described in this disclosure. They may provide exposure quadratically dependant on the intensity of the light. Several specific examples, including but not limited to using nanocrystals, are also described. Combined with double patterning, these approaches may create sub-diffraction limit feature density.
Claims38
A resist comprising:
- at least one matrix material;
- and
- at least one photoactive material carried by said matrix material, said photoactive material producing chemical species in at least one plural-step reaction, said chemical species changing the solubility of said resist,
- wherein said chemical species production is non-linearly dependent on the intensity of light.
A method of exposing a resist comprising:
- illuminating at least part of said resist with a light source;
- inducing, in said resist in a manner that is quadratically dependent on the intensity of said illuminating light, at least one chemical species production based on at least one plural-step reaction;
- and
- changing the solubility of said resist with said chemical species production.
A method of manufacturing an article comprising:
- disposing a resist on a substrate;
- illuminating at least part of said resist with a light source;
- inducing, in said resist in a manner that is quadratically dependent on the intensity of said illuminating light, at least one chemical species production based on at least one plural-step reaction;
- changing the solubility of said resist with said chemical species production;
- and
- further processing said changed-solubility resist to fabricate at least one structure on said substrate.
An integrated circuit comprising:
- a substrate;
- and
- at least one structure disposed on said substrate, said at least one structure being formed at least in part by illuminating at least part of said resist with a light source;
- inducing, in said resist in a manner that is quadratically dependent on the intensity of said illuminating light, at least one chemical species production based on at least one plural-step reaction;
- changing the solubility of said resist with said chemical species production;
- and further processing said changed-solubility resist.
An optical device comprising:
- a substrate;
- and
- at least one optical structure disposed on said substrate, said at least one optical structure being formed at least in part by illuminating at least part of said resist with a light source;
- inducing, in said resist in a manner that is quadratically dependent on the intensity of said illuminating light, at least one chemical species production based on at least one plural-step reaction;
- changing the solubility of said resist with said chemical species production;
- and further processing said changed-solubility resist.
Dependencies are inferred from the claim text.