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AssigneeSamsung Electronics Co., Ltd.
InventorsMyong-do Ro, Hyun-Ki Kim, Soon-young Hong
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A photo-curable composition includes 100 parts by weight of a urethane-polydimethylsiloxane copolymerization prepolymer formed by a reaction of a polyol having two or more hydroxyl groups in a molecule thereof, a reactive polydimethylsiloxane having at least one reactive group selected from the group consisting of an amino group, an epoxy group, a carboxy group, a hydroxy group, a halogen atom, a thiol group, and (meth)acrylate, in the side chain or terminal group thereof, and an aliphatic or aromatic polyisocyanate compound; 10-80 parts by weight of (meth)acrylate-based monomer having a functionality of 4 or less, based on 100 parts by weight of the urethane-polydimethylsiloxane copolymerization prepolymer; and 0.1-10 parts by weight of a photoinitiator, based on 100 parts by weight of the urethane-polydimethylsiloxane copolymerization prepolymer. The photo-curable composition has an inherently excellent releasing property and a pattern transfer property. Accordingly, the use of the photo-curable composition can enhance performance efficiency of repeatedly transferring nano- or micro-scale patterns, such as in the fabrication of an optical recording medium.
A photo-curable composition comprising:
A method of forming a patterned polymer layer on a substrate, the method comprising:
Dependencies are inferred from the claim text.