Apparatus and method for forming magnetic film
OwnerXinming Wang, Akira Owatari +3inventors
InventorsXinming Wang, Akira Owatari, Takashi Koba, Tsutomu Nakada, Akira Fukuda
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Abstract
A magnetic film forming apparatus can form a magnetic film, especially a magnetic alloy film, selectively on a metal surface exposed on a surface of a substrate, such as a semiconductor wafer. The magnetic film forming apparatus comprises an electroless plating apparatus having a magnetic field generation apparatus for generating a magnetic field around and parallel to a substrate disposed such that the surface of the substrate is in contact with a plating solution in a plating tank.
Claims23
An apparatus for forming a magnetic film selectively on a metal surface exposed on a surface of a substrate, the apparatus comprising an electroless plating apparatus having a magnetic field generation apparatus for generating a magnetic field around and parallel to a substrate disposed such that the surface of the substrate is in contact with a plating solution in a plating tank.
An apparatus for forming a magnetic film selectively on a metal surface exposed on a surface of a substrate, the apparatus comprising an electroless plating apparatus including:
- a plating tank for holding a plating solution therein;
- a substrate holder for holding a substrate and bringing a surface of the substrate into contact with the plating solution in the plating tank;
- and
- a magnetic field generation apparatus, disposed outside the plating tank, for generating a magnetic field around and parallel to the substrate disposed such that the surface of the substrate is in contact with the plating solution in the plating tank.
A method for forming a magnetic film, comprising applying a magnetic field around and parallel to a substrate while keeping a surface of the substrate in contact with a plating solution to carry out electroless plating of the surface of the substrate, thereby forming a magnetic film selectively on a metal surface exposed on the surface of the substrate.
Dependencies are inferred from the claim text.