Substrate treatment method, coating treatment apparatus, and substrate treatment system

A coating treatment apparatus for forming a coating film on a rear surface of a substrate, comprising:

• a treatment container housing the substrate;
• a partition member partitioning said treatment container into a first treatment chamber and a second treatment chamber;
• a transfer arm transferring the substrate transferred into said treatment container;
• a turning mechanism supporting said transfer arm and turning said transfer arm around a horizontal axis;
• a raising and lowering mechanism supporting said turning mechanism and raising and lowering said turning mechanism;
• a transfer mechanism supporting said raising and lowering mechanism and transferring said raising and lowering mechanism in the horizontal direction between said first treatment chamber and said second treatment chamber;
• a substrate holding unit located in said first treatment chamber for horizontally holding the substrate with the rear surface of the substrate directed upward;
• a coating nozzle located in said first treatment chamber for applying a coating solution to the rear surface of the substrate held by said substrate holding unit;
• and
• a curing processing unit located in said second treatment chamber for curing the coating solution applied from said coating nozzle to the rear surface of the substrate.

A substrate treatment system including a coating treatment apparatus for forming a coating film on a rear surface of a substrate and an exposure processing apparatus for performing exposure processing on the substrate,

• said coating treatment apparatus comprising:
• a treatment container housing the substrate;
• a partition member partitioning said treatment container into a first treatment chamber and a second treatment chamber;
• a transfer arm transferring the substrate transferred into said treatment container;
• a turning mechanism supporting said transfer arm and turning said transfer arm around a horizontal axis;
• a raising and lowering mechanism supporting said turning mechanism and raising and lowering said turning mechanism;
• a transfer mechanism supporting said raising and lowering mechanism and transferring said raising and lowering mechanism in the horizontal direction between said first treatment chamber and said second treatment chamber;
• a substrate holding unit located in said first treatment chamber for horizontally holding the substrate with the rear surface of the substrate directed upward;
• a coating nozzle located in said first treatment chamber for applying a coating solution to the rear surface of the substrate held by said substrate holding unit;
• and
• a curing processing unit located in said second treatment chamber for curing the coating solution applied from said coating nozzle to the rear surface of the substrate.