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US 2008/0175981 A1Published application
Pattern formation method
AssigneeSeiko Epson Corporation
InventorKatsumi Suzuki
Life of this patent
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Abstract
A pattern formation method includes forming a plurality of concave parts adjacent to each other on a substrate, and discharging droplets including a functional liquid material on the substrate to form a prescribed pattern of the functional liquid material that straddles over the concave parts on the substrate.
Claims9
A pattern formation method comprising:
- forming a plurality of concave parts adjacent to each other on a substrate;
- and
- discharging droplets including a functional liquid material on the substrate to form a prescribed pattern of the functional liquid material that straddles over the concave parts on the substrate.
Dependencies are inferred from the claim text.