Method and apparatus for treating waste gas containing acid and/or base
AssigneeIndustrial Technology Research Institute
InventorsHung Min Chein, Hsin-Hsien Wu, Shankar Gopala Aggarwal, Chuen-Jinn Tsai
Life of this patent
Estimating the term…
Loading patent…
AssigneeIndustrial Technology Research Institute
InventorsHung Min Chein, Hsin-Hsien Wu, Shankar Gopala Aggarwal, Chuen-Jinn Tsai
Estimating the term…
A method for treating waste gas containing acid and/or base, employing fine spray-scrubbing technology for treating the waste gas mentioned above, wherein the scrubbing solution is atomized to generate mists with droplet size of 1 to 100 μm. Another feature of the present invention is to combine the application of surfactant in wet scrubbing technology for treating waste gas containing acids, bases, or both, especially, in a low concentration. Another feature of the present invention is to combine spray tower and/or packed tower and/or other scrubbers vertically/horizontally to get enhanced performance of the conventional control systems.
An apparatus for treating waste gas containing acid and/or base, comprising:
An apparatus for treating waste gas containing acid and/or base, comprising:
Dependencies are inferred from the claim text.