Optical integrated device manufacturing process and device manufactured by the process thereof

An integrated optical device (100) comprising:

• a multilayer deposited on a support substrate, the multilayer including first and second cladding layers in order to hold in a multilayer first region a core layer of a waveguide of the optical device, said core being provided with at least an electromagnetic radiation inlet/outlet port;
• a cavity (11) obtained in a multilayer second region adjacent said first region, said cavity being provided with a first wall which is inclined relative to the substrate such as to at least partially extend in said first region and turning out to be near said inlet/outlet port;
• characterized in that it further comprises a regulation layer obtained at least in said multilayer first region such as to be sandwiched between the substrate and the first cladding layer, said regulation layer having associated a first etching speed distinguished from respective etching speeds of said first and second cladding layers.

The integrated optical device according to claim, comprising a further waveguide core layout in said multilayer second region, said further core having a respective electromagnetic radiation inlet/outlet port in the proximity of a second wall of said cavity (11) which is inclined relative to the substrate and opposite said first wall.