Electroconductive laminate, electromagnetic wave shielding film for plasma display and protective plate for plasma display
AssigneeAsahi Glass Company, Limited
InventorsTamotsu MORIMOTO, Masato Kawasaki, Hideaki Miyazawa
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Abstract
An electroconductive laminate comprising a substrate and an electroconductive film formed on the substrate, wherein the electroconductive film has a multilayer structure having a high refractive index layer containing an inorganic compound and a metal layer alternately laminated from the substrate side in a total layer number of (2n+1) (wherein n is an integer of from 1 to 12); the refractive index of the inorganic compound is from 1.5 to 2.7; the metal layer is a layer containing silver; the total thickness of all metal layer(s) is from 25 to 100 nm; and the resistivity of the electroconductive film is from 2.5 to 6.0 μΩcm.
Claims18
An electroconductive laminate comprising a substrate and an electroconductive film formed on the substrate, wherein the electroconductive film has a multilayer structure having a high refractive index layer containing an inorganic compound and a metal layer alternately laminated from the substrate side in a total layer number of (2n+1) (wherein n is an integer of from 1 to 12);
- the refractive index of the inorganic compound is from 1.5 to 2.7;
- the metal layer is a layer containing silver;
- the total thickness of all metal layer(s) is from 25 to 100 nm;
- and the resistivity of the electroconductive film is from 2.5 to 6.0 μΩcm.
An electromagnetic wave shielding film for a plasma display, which is an electroconductive laminate comprising a substrate and an electroconductive film formed on the substrate, wherein the electroconductive film has a multilayer structure having a high refractive index layer containing an inorganic compound and a metal layer alternately laminated from the substrate side in a total layer number of (2n+1) (wherein n is an integer of from 1 to 12);
- the refractive index of the inorganic compound is from 1.5 to 2.7;
- the metal layer is a layer containing silver;
- the total thickness of all metal layer(s) is from 25 to 100 nm;
- and the resistivity of the electroconductive film is from 2.5 to 6.0 μΩcm.
Dependencies are inferred from the claim text.