Projection objective for lithography
AssigneeCarl Zeiss SMT GmbH
InventorsHeiko Feldmann, Susanne Beder, Aurelian Dodoc, Alexander Epple, Hans-Juergen Rostalski
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Abstract
In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.
Claims17
A projection objective, comprising:
- an optical arrangement of optical elements between an object plane of the projection objective and an image plane of the projection objective, the optical arrangement having at least one intermediate image plane, the optical arrangement, comprising:
- a first correction element arranged optically at least in the vicinity of a pupil plane of the projection objective;
- and
- a second correction element arranged in a region which is not optically near either the pupil plane of the projection objective or a field plane of the projection objective,
- wherein the projection objective is configured to be used as a lithographic projection objective.
Dependencies are inferred from the claim text.