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US 2008/0174755 A1Published application
Movable Stage Apparatus
AssigneeCanon Kabushiki Kaisha
InventorKazuyuki Ono
Life of this patent
Estimating the term…
Abstract
This invention aims at preventing a space including the guide surface of a reticle stage from interfering with an exposure light beam. In order to achieve this object, in a movable stage apparatus having a reticle stage on which a reflecting reticle is to be mounted, when the space is divided by a plane including the reflection surface of the reticle, the guide surface for moving the reticle is arranged in a space opposite to a space where an exposure light beam reflected by the reticle passes.
Claims13
1-15. (canceled)
An exposure apparatus comprising:
- a movable stage apparatus, said movable stage apparatus including a master stage on which a reflecting master is to be mounted,
- wherein when a space is divided by a plane including a reflection surface of the master, a guide surface to guide movement of the master stage is arranged in a space opposite to a space where an exposure light beam to be reflected by the master passes.
Dependencies are inferred from the claim text.