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US 2008/0174752 A1Published application
Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsPIETER RENAAT MARIA HENNUS, JEROEN JOHANNES SOPHIA MARA MERTENS, PATRICK JOHANNES CORNELUS HENDRIK SMULDERS, PETER SMITS
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Abstract
A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the different parts.
Claims20
A lithographic apparatus, comprising:
- a substrate table configured to hold a substrate;
- a seal structure located between an object and the substrate table, the seal structure configured to create a seal between the object and a part of the substrate table;
- and
- an adhesive applied to at least one end of the seal structure such that the seal structure is configured to undergo a pivoting movement at the at least one end.
1 more element
A device manufacturing method, comprising:
- projecting a beam of radiation onto a substrate, wherein a seal structure is located between an object and a part of a substrate table configured to hold the substrate, at least of end of the seal structure being adhered to a part of the substrate table by an adhesive such that the seal structure is configured to undergo a pivoting movement at the at least one end.
A lithographic apparatus, comprising:
- a substrate table configured to hold a substrate;
- and
- a seal structure located between an object and the substrate table and configured to create a seal between the object and a part of the substrate table, a neutral axis of the object being substantially in a plane of the seal structure.
A device manufacturing method, comprising:
- projecting a beam of radiation onto a substrate, wherein a seal structure is located between an object and a part of a substrate table configured to hold the substrate, the seal structure creating a seal between the object and a part of the substrate table and a neutral axis of the object being substantially in a plane of the seal structure.
Dependencies are inferred from the claim text.