Back to results
US 2008/0174749 A1Published application
In-tool and Out-of-Tool Protection of Extreme Ultraviolet (EUV) Reticles
AssigneeIntel Corporation
InventorsArun Ramamoorthy, Robert Bristol
Life of this patent
Estimating the term…
Abstract
A reticle carrier for an Extreme Ultraviolet (EUV) reticle may include nested grids of electret fibers to provide active protection from contamination without a power supply. The reticle carrier may include in-line sensors for in-situ monitoring of contamination. Grids of electret fibers may also be used in an EUV pellicle.
Claims20
A reticle carrier comprising:
- a plurality of walls, each wall having an interior side and an exterior side, wherein the interior sides of the walls are arranged to define a sealable cavity;
- a reticle holder disposed within the cavity
- a sensor within said cavity, wherein said sensor is to sensitive to a property of particles in the cavity;
- and
- an output to convey particle information from the sensor out of the cavity of the reticle carrier.
2 more elements
A device comprising:
- a debris trap dimensioned to be positionable between an illumination source and a reticle in a lithography system, wherein the debris trap comprises a frame and a plurality of electret fibers attached to the frame.
A lithography system comprising:
- a plurality of walls, each wall having an interior side and an exterior side, wherein the interior sides of the walls are arranged to define a sealable chamber that is dimensioned to receive a reticle;
- a reticle holder within the chamber, wherein the reticle holder is dimensioned to hold a patterning face of a reticle facing a first direction;
- a frame holder;
- and
- a frame having a plurality of electret fibers attached thereto,
- wherein the frame holder is positioned to hold the
3 more elements
Dependencies are inferred from the claim text.