Ion implantation device and method for implanting ions
AssigneeDenso Corporation
InventorsKatsuhiro Ohno, Koji Matsumoto
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Abstract
An ion implantation device includes: an ion source for retrieving an ion beam; a passage for passing the ion beam therethrough; a mass analysis magnet for selecting a predetermined ion species from the ion beam, the mass analysis magnet disposed in the passage; an implantation chamber for implanting the predetermined ion species in a target with the ion beam output from the mass analysis magnet; and an inner pressure controller for introducing an gas into the passage and for controlling an inner pressure of the passage. Since the above device includes the inner pressure controller, a concentration profile of the implanted ions in the target is appropriately controlled.
Claims9
An ion implantation device comprising:
- an ion source for retrieving an ion beam;
- a passage for passing the ion beam therethrough;
- a mass analysis magnet for selecting a predetermined ion species from the ion beam, the mass analysis magnet disposed in the passage;
- an implantation chamber for implanting the predetermined ion species in a target with the ion beam output from the mass analysis magnet;
- and
- an inner pressure controller for introducing an gas into the passage and for controlling an inner pressure of the passage.
A method for implanting ions into a target comprising:
- retrieving an ion beam from an ion source;
- passing the ion beam through a passage;
- selecting a predetermined ion species from the ion beam with a mass analysis magnet, wherein the magnet is disposed in the passage;
- accelerating and decelerating the ion beam with an acceleration and deceleration tube, the ion beam retrieved from the magnet;
- implanting the predetermined ion species into the target, which is disposed in an implantation chamber;
- and
- introducing a gas into the passage and controlling an inner pressure of the passage with an inner pressure controller, wherein
- the implanting the predetermined ion species is performed after the introducing the gas and controlling the inner pressure.
Dependencies are inferred from the claim text.