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US 2008/0166951 A1Published application
Sapphire substrates and methods of making same
AssigneeSaint-Gobain Ceramics & Plastics, Inc.
InventorsBrahmanandam V. Tanikella, Palaniappan Chinnakaruppan, Robert A. Rizzuto, Isaac K. Cherian, Ramanujam Vedantham
Life of this patent
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Abstract
A sapphire substrate includes a generally planar surface having a crystallographic orientation selected from the group consisting of a-plane, r-plane, m-plane, and c-plane orientations, and having a nTTV of not greater than about 0.037 μm/cm2, wherein nTTV is total thickness variation normalized for surface area of the generally planar surface, the substrate having a diameter not less than about 9.0 cm.
Claims33
A method of machining a sapphire substrate comprising:
- grinding a first surface of a sapphire substrate using a first fixed abrasive;
- and
- grinding said first surface of the sapphire substrate using a second fixed abrasive, wherein the second fixed abrasive has a smaller average grain size than the first fixed abrasive, the second fixed abrasive being self-dressing.
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Dependencies are inferred from the claim text.