Mask used for LIGA process, method of manufacturing the mask, and method of manufacturing microstructure using LIGA process

A method for manufacturing a mask used for a Lithographie, Galvanofomung, and Abformung process, the method comprising:

• stacking an X-ray absorbing layer on a substrate for allowing X-rays to pass through the substrate;
• and
• etching the X-ray absorbing layer to form a plating pattern forming a plating hole, an aligning pin pattern forming an aligning pin disposed to align a plurality of stacked photosensitive layers, and an aligning pinhole pattern forming an aligning pinhole in which the aligning pin is inserted in a photosensitive layer.

A method for manufacturing a microstructure using a Lithographie, Galvanofomung, and Abformung process, the method comprising:

• forming a substrate for the microstructure, a plurality of photosensitive layers, each photosensitive layer having a plating hole and an aligning pinhole, and an aligning pin insertable into the aligning pinhole, with the aligning pinholes of the plurality of photosensitive layers being formed in positions corresponding to each other;
• and
• repeating a process of stacking the photosensitive layer on the substrate for the microstructure and plating the plating hole of the stacked photosensitive layer with metal for forming a plating layer for a number of times corresponding to the number of the photosensitive layers, and when the photosensitive layers are stacked on the substrate for the microstructure, the photosensitive layers become aligned with one another by inserting the aligning pin into the aligning pinholes of all of the photosensitive layers stacked on the substrate for the microstructure to penetrate all the photosensitive layers.