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US 2008/0166473 A1Published application
Method of producing diffractive thin-film piezoelectric micromirror
AssigneeSamsung Electro-Mechanics Co., Ltd.
InventorsSeung-Do An, Sang Kyeong Yun, Jong-Hyeong Song
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Abstract
Disclosed is a method of producing a diffractive micromirror. More particularly, the present invention pertains to a method of producing a diffractive micromirror, in which a recess having a desired depth and width is precisely formed in a piezoelectric operation manner.
Claims20
A method of producing a diffractive thin-film piezoelectric micromirror, comprising:
- forming an insulating layer in a substrate so that the insulating layer has a predetermined thickness from a predetermined depth of the substrate;
- applying a mask on the substrate and subsequently forming oxidized walls;
- forming a piezoelectric layer on the substrate;
- and
- removing a sacrificial portion of the insulating layer to create a gap between the piezoelectric layer and the substrate to complete production of the diffractive thin-film piezoelectric micromirror.
2 more elements
A method of producing a diffractive thin-film piezoelectric micromirror array, comprising:
- forming an insulating layer in a substrate so that the insulating layer has a predetermined thickness from a predetermined depth of the substrate;
- applying a mask on the substrate and subsequently forming oxidized walls;
- forming a piezoelectric layer on the substrate;
- removing a sacrificial portion of the insulating layer to create a gap between the piezoelectric layer and the substrate;
- and
- patterning the piezoelectric layer to produce a diffractive thin-film piezoelectric micromirror array.
3 more elements
Dependencies are inferred from the claim text.