Wet clean system design

A cluster tool for cleaning a substrate, comprising:

• a first processing rack comprising:
• two or more process chambers that each have one or more walls that form a processing region, wherein each of the two or more process chambers are configured to process a substrate in a vertical orientation;
• a chamber actuator assembly that are adapted to dispose a substrate in each of the two or more process chambers simultaneously;
• and
• a fluid source that is fluidly coupled to each of the two or more process chambers, wherein the fluid source is adapted to deliver a desired volume of a liquid to the processing regions of each of the two or more processing chambers from a fluid reservoir;
• and
• a robot assembly that comprises:
• a first robot having a robot blade assembly that has a substrate supporting surface, and the first robot is adapted to position a substrate at one or more points contained within a first plane, wherein the first plane is parallel to the first direction and a second direction;
• an actuator that is coupled to the robot blade assembly and is adapted to position the substrate supporting surface in an angular orientation relative to a horizontal plane;
• a first motion assembly that is adapted to position the first robot in a third direction that is perpendicular to the first plane;
• and
• a second motion assembly that is adapted to position the first robot in a direction parallel to the first direction.

A method of processing a substrate in a cluster tool, comprising:

• positioning a first substrate on a first substrate supporting device using a robot assembly;
• positioning a second substrate on a second substrate supporting device using the robot assembly;
• transferring the first substrate to a first end-effector and the second substrate to a second end-effector;
• positioning the first substrate in a processing region of a first processing chamber and the second substrate in a processing region of a second processing chamber simultaneously;
• simultaneously disposing a first processing liquid in the first processing region and the second processing region simultaneously.

A cluster tool for cleaning a substrate, comprising:

• two or more process chambers that are configured to process a substrate in a vertical orientation, wherein the two or more process chambers are positioned a distance apart along a first direction, and each of the two or more process chambers comprise:
• one or more walls that form a processing region;
• and
• a first megasonic actuator that is adapted to deliver energy to a processing side of a substrate that is positioned in the processing region;
• a robot assembly that comprises:
• a first robot having a robot blade assembly that has a substrate supporting surface, and the first robot is adapted to position a substrate at one or more points contained within a first plane, wherein the first plane is parallel to the first direction;
• a first motion assembly that is adapted to position the first robot in a third direction that is perpendicular to the first plane;
• and
• a second motion assembly that is adapted to position the first robot in a direction parallel to the first direction;
• a chamber actuator assembly that has two or more end-effector assemblies, wherein the chamber actuator assembly is adapted to position one of the two or more end-effector assemblies in each of the two or more process chambers simultaneously;
• two or more chamber pass-through supports that are each adapted to receive one or more substrates from the robot assembly;
• and
• a support actuator that is adapted to position the two or more chamber pass-through supports so that each of the two or more end-effector assemblies can simultaneously receive a substrate from at least one of the two or more chamber pass-through supports.