Method and system for evaluating an evaluated pattern of a mask
AssigneeApplied Materials Israel Ltd.
InventorsIshai Schwarzband, Shmoolik Mangan, Chaim Braude, Michael Ben-Yishai, Gadi Greenberg
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Abstract
A method, system and a computer program product for evaluating an evaluated pattern of a mask, the method includes: receiving multiple moments that represent an image of the evaluated pattern; wherein a size of information required for representing the multiple moments is substantially smaller than a size of pixel information that form the image of the evaluated pattern; and processing the multiple moments in order to determine at least one shape parameter of the evaluated pattern.
Claims33
A method for evaluating an evaluated pattern of a mask, the method comprising:
- receiving or calculating multiple moments that represent an image of the evaluated pattern;
- wherein a size of information required for representing the multiple moments is substantially smaller than a size of pixel information that form the image of the evaluated pattern;
- and
- processing the multiple moments in order to determine at least one shape parameter of the evaluated pattern.
A system for evaluating a evaluated pattern of a mask, the system comprising:
- a memory unit adapted to store multiple moments that represent an image of the evaluated pattern;
- wherein a size of information required for representing the multiple moments is substantially smaller than a size of pixel information that form the image of the evaluated pattern;
- and
- a processor that is adapted to process the multiple moments in order to determine at least one shape parameter of the evaluated pattern.
A computer program product comprising a computer useable medium having a computer readable program, wherein the computer readable program, when executed on a computer, causes the computer to:
- receive or calculate multiple moments that represent an image of the evaluated pattern;
- wherein a size of information required for representing the multiple moments is substantially smaller than a size of pixel information that form the image of the evaluated pattern;
- and process the multiple moments in order to determine at least one shape parameter of the evaluated pattern.
Dependencies are inferred from the claim text.