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AssigneeASML Netherlands B.V.
InventorsEverhardus Cornelis Mos, Maurits Van Der Schaar, Hubertus Johannes Gertrudus Simons
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A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support for a patterning device, a substrate table for a substrate, a projection system, and a control system. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The projection system is configured to project the patterned radiation beam as an image onto a target portion of the substrate along a scan path. The scan path is defined by a trajectory in a scanning direction of an exposure field of the lithographic apparatus. The control system is coupled to the support, the substrate table and the projection system for controlling an action of the support, the substrate table and the projection system, respectively. The control system is configured to correct a local distortion of the image in a region along the scan path by a temporal adjustment of the image in that region.
A method of imaging overlapping patterns on a target field of a substrate, comprising:
An apparatus arranged to determine a value of a process parameter of a process for creating overlapping patterns on a substrate comprising:
An apparatus for creating a first pattern of several overlapping patterns on a substrate comprising a substrate table to hold the substrate, and comprising:
Dependencies are inferred from the claim text.