Electrostatic actuator, droplet discharging head, method of manufacturing thereof and droplet discharging device
AssigneeSeiko Epson Corporation
InventorsKoji KITAHARA, Motoki ITODA, Masahiro FUJII, Yoshifumi HANO
Life of this patent
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Abstract
An electrostatic actuator comprises: a fixed electrode formed on a substrate; a movable electrode placed at an position opposing the fixed electrode via a predetermined gap; a driving unit giving the movable electrode a displacement by generating an electrostatic force between the fixed electrode and the movable electrode: and an insulation film made of HfxAlyOz formed on an opposing surface of at least one of the fixed electrode and the movable electrode.
Claims15
An electrostatic actuator comprising:
- a fixed electrode formed on a substrate;
- a movable electrode placed at an position opposing the fixed electrode via a predetermined gap;
- a driving unit giving the movable electrode a displacement by generating an electrostatic force between the fixed electrode and the movable electrode:
- and
- an insulation film made of HfxAlyOz formed on an opposing surface of at least one of the fixed electrode and the movable electrode.
A method of manufacturing an electrostatic actuator having a fixed electrode formed on a substrate, a movable electrode placed at a position opposing the fixed electrode via a predetermined gap, and a driving unit giving the movable electrode a displacement by generating an electrostatic force between the fixed electrode and the movable electrode, the method comprising:
- forming the fixed electrode on a glass substrate;
- forming an insulating film made of HfxAlyOz by an atomic layer deposition (ALD) method on an entire surface of a silicon substrate bonded to the glass substrate;
- bonding the glass substrate to the silicon substrate with anodization;
- thinning the silicon substrate on the bonded substrate to be a thin plate;
- forming the movable electrode by etching a surface of the silicon substrate, which opposes the bonded surface of the silicon substrate.
A method of manufacturing an electrostatic actuator having a fixed electrode formed on a substrate, a movable electrode placed at a position opposing the fixed electrode via a predetermined gap, and a driving unit giving the movable electrode a displacement by generating an electrostatic force between the fixed electrode and the movable electrode, the method comprising:
- forming the fixed electrode on a glass substrate;
- forming an insulating film made of HfxAlyOz by an atomic layer deposition (ALD) method on the fixed electrode;
- bonding the glass substrate to the silicon substrate with anodization;
- thinning the silicon substrate on the bonded substrate to be a thin plate;
- and
- forming the movable electrode by etching a surface of the silicon substrate, which opposes the bonded surface of the silicon substrate.
A method of manufacturing an electrostatic actuator having a fixed electrode formed on a substrate, a movable electrode placed at a position opposing the fixed electrode via a predetermined gap, and a driving unit giving the movable electrode a displacement by generating an electrostatic force between the fixed electrode and the movable electrode, the method comprising:
- forming the fixed electrode on a glass substrate;
- forming an SiO2 insulating film on the fixed electrode;
- forming an insulating film made of HfxAlyOz by an atomic layer deposition (ALD) method on an entire surface of a silicon substrate bonded to the glass substrate;
- bonding the glass substrate to the silicon substrate with anodization;
- thinning the silicon substrate on the bonded substrate to be a thin plate;
- and
- forming the movable electrode by etching a surface of the silicon substrate, which opposes the bonded surface of the silicon substrate.
A method of manufacturing an electrostatic actuator having a fixed electrode formed on a substrate, a movable electrode placed at a position opposing the fixed electrode via a predetermined gap, and a driving unit giving the movable electrode a displacement by generating an electrostatic force between the fixed electrode and the movable electrode, the method comprising:
- forming the fixed electrode on a glass substrate;
- forming an insulating film made of HfxAlyOz by an atomic layer deposition (ALD) method on the fixed electrode;
- forming an SiO2 insulating film on the entire surface of the silicon substrate bonded to the glass substrate;
- bonding the glass substrate to the silicon substrate with anodization;
- thinning the silicon substrate on the bonded substrate to be a thin plate;
- and
- forming the movable electrode by etching a surface of the silicon substrate, which opposes the bonded surface of the silicon substrate.
Dependencies are inferred from the claim text.