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US 2008/0164637 A1Published application
Release surfaces, particularly for use in nanoimprint lithography
OwnerStephen Y. Chouinventor
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Abstract
The present invention relates to release surfaces, particularly release surfaces with fine features to be replicated, and to lithography which may be used to produce integrated circuits and microdevices. More specifically, the present invention relates to a process of using an improved mold or microreplication surface that creates patterns with ultra fine features in a thin film carried on a surface of a substrate.
Claims5
A lithographic method for forming a pattern on a moldable surface on a substrate comprising the steps of
- providing the substrate including the moldable surface;
- providing a mold having a molding surface comprised of protruding features and recessed features for molding a pattern having at least one feature with minimum dimension of less than 200 nm;
- urging together the molding surface and the moldable surface;
- and
- separating the molding surface and the moldable surface.
2 more elements
Dependencies are inferred from the claim text.