Semiconductor Integrated Circuit

A semiconductor integrated circuit comprising a real pattern group including a plurality of wiring patterns for providing connection either between a pair of circuits, between a pair of elements or between a circuit and an element, the real pattern group being formed in each of a plurality of wiring layers, and a plurality of dummy patterns formed in a region of each said wiring layer in which the real pattern group is not placed,

• wherein, when the direction of extension of one of the plurality of wiring patterns is used as a reference direction, the plurality of dummy patterns are a plurality of inclined dummy patterns inclined at a predetermined angle toward the reference direction, and
• some of the plurality of inclined dummy patterns formed in a first wiring layer of the plurality of wiring layers cross some of the wiring patterns formed in a second wiring layer different from the first wiring layer when viewed in plane.

A semiconductor integrated circuit comprising a real pattern group including a plurality of wiring patterns for providing connection either between a pair of circuits, between a pair of elements or between a circuit and an element, the real pattern group being formed in each of a plurality of wiring layers, and a plurality of dummy patterns formed in a region of each said wiring layer in which the real pattern group is not placed,

• wherein, when the direction of extension of one of the plurality of wiring patterns is used as a reference direction, the plurality of dummy patterns are a plurality of inclined dummy patterns inclined at a predetermined angle toward the reference direction, and
• some of the plurality of inclined dummy patterns are located the same distance away from one of the wiring patterns formed in one of the wiring layers in which said some of the plurality of inclined dummy patterns are formed.